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Ultra-high performance electron beam lithography system

Make/model RAITH, EBPG 5200 plus
Details A 100kV ultra-high-performance electron beam lithography system suitable for nanoscale writing at frequencies up to 125MHz.
Facility Institute for Compound Semiconductors
School School of Physics and Astronomy

Get in touch

Institute for Compound Semiconductors (ICS)

Email
ics@cardiff.ac.uk

Location

Translational Research Hub
Maindy Road
Cathays
CF24 4HQ