Ultra-high performance electron beam lithography system
Make/model | RAITH, EBPG 5200 plus |
---|---|
Details | A 100kV ultra-high-performance electron beam lithography system suitable for nanoscale writing at frequencies up to 125MHz. |
Facility | Institute for Compound Semiconductors |
School | School of Physics and Astronomy |
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Institute for Compound Semiconductors (ICS)
Location
Translational Research Hub
Maindy Road
Cathays
CF24 4HQ
Maindy Road
Cathays
CF24 4HQ