Nano imprint lithography system
| Make/model | Mii Impio 55 nano imprint lithography |
|---|---|
| Details | Wafers: silicon, fused silicon, others (8"wafer size), Technical parameters: monomat resist,step and flash technique, resolution < 50nm, etc.. |
| Facility | |
| School | School of Engineering |
Location
Queen's Buildings
5 The Parade
Newport Road
CF24 3AA
5 The Parade
Newport Road
CF24 3AA