Maskless optical lithography system
| Make/model | Heidelberg, MLA150 System |
|---|---|
| Details | A maskless optical lithography tool that uses a 2-dimensional Spatial Light Modulator to project patterns directly onto resist coated wafers. |
| Facility | Institute for Compound Semiconductors |
| School | School of Physics and Astronomy |
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Institute for Compound Semiconductors (ICS)
Location
Translational Research Hub
Maindy Road
Cathays
CF24 4HQ
Maindy Road
Cathays
CF24 4HQ