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ICP-RIE Etch tool

Make/model Oxford Instruments, PlasmPro 100 Cobra 300.
Details Plasma etch tool - III-V, GaN, SiN etching.
Facility Institute for Compound Semiconductors
School School of Physics and Astronomy

Get in touch

Stuart Thomas

Email
ics@cardiff.ac.uk

Location

Translational Research Hub
Maindy Road
Cathays
CF24 4HQ