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Atomic Layer Deposition (ALD)

Make/model Beneq, ALD, Thin Film System TFS200*
Details ALD deposition of TiO2, TiN, Ta2O5, Al2O3, ZnO, SiO2, SiN, NiO, ITO, MoO.
Facility Institute for Compound Semiconductors
School School of Physics and Astronomy

Get in touch

Saleem Shabbir

Email
ics@cardiff.ac.uk

Location

Translational Research Hub
Maindy Road
Cathays
CF24 4HQ