Nano imprint lithography system

Brand/model	Mii Impio 55 nano imprint lithography
Manylion	Wafers: silicon, fused silicon, others (8"wafer size), Technical parameters: monomat resist,step and flash technique, resolution < 50nm, etc..
Cyfleuster
Ysgol	Yr Ysgol Peirianneg

Lleoliad

Queen's Buildings
5 The Parade
Heol Casnewydd
CF24 3AA